期刊论文

中文

真空

1002-0322

2017

54

1

17-21

10.13385/j.cnki.vacuum.2017.01.05

本校为第一机构

磁控溅射电源在镀膜领域有着广泛的应用。设计研制一种新拓扑结构的多模式输出镀膜电源,将高频PWM整流技术、全桥变换器与直流降压电路相结合;通过合理的时序控制实现直流溅射、单向脉冲、双向对称和双向不对称等四种溅射模式;运用DSP数字控制器灵活实现对高频PWM整流器输出幅值、工作模式,以及溅射脉冲宽度、频率的设置。实验样机证明,本设计能实现多模式输出,输出幅值范围为200V-750V,频率最大为200k Hz,占空比10%-90%可调,功率因数不低于0.97。该技术将多个镀膜功能集成到同一个设备中,设备体积小、降低成本、提高了利用率,谐波污染低,具有很好的推广应用价值。

Magnetron sputtering power supply（MSPS） is widely used in coating film. A novel topology structure MSPS with multi-mode output waves is designed,which is combined with high frequency PWM rectification technology, full bridge converter and DC BUCK circuit, implemented four sputtering output such as DC sputtering,unipolar pulse, bipolar symmetry pulse and bipolar asymmetric pulse through reasonable sequential control. And realize flexible high frequency PWM rectification setting of output amplitude, operation mode,pulse width and frequency usin...