期刊论文

Effect of Deposition Temperature on Structure and Surface Morphology of TiN Thin Films Prepared by DC Magnetron Sputtering

中文

南华大学学报(自然科学版)

1673-0062

2017

31

4

86-89

10.19431/j.cnki.1673-0062.2017.04.017

核设施退役和核泄漏安全处理技术及装备研发（02072012KIT01）；

本校为第一机构

利用直流磁控溅射技术,在锆合金基体表面上研究不同基体温度对沉积TiN薄膜的影响.分别采用X射线衍射仪和扫描电子显微镜（SEM）对TiN薄膜结构、表面形貌和截面形貌进行了研究.研究结果表明：TiN薄膜在不同沉积温度下晶格取向是不同的;200℃时,TiN为随机取向;300℃时,TiN薄膜以（111）为择优取向;400℃时,薄膜晶化质量不断提高,最后逐渐趋于稳定.300℃时,薄膜的致密性与均匀性较好,表面无明显缺陷.

The effects of different substrate temperatures on the TiN thin films were investigated on the surface of zirconium alloy by DC magnetron sputtering. The structure,surface morphology and cross-sectional morphology of TiN films were studied by X-ray diffraction and scanning electron microscopy（ SEM）. The results show that the lattice orientation of TiN thin films is different at different deposition temperatures. At 200 ℃,the orientationwere random; At 300 ℃,the（ 111） plane is the preferred one; At 400 ℃,the crystallization quality of the...