期刊论文

The Research on Calibration of 220Rn Measurement about Semiconductor Detection-based 220Rn Measurement Instrument

中文

南华大学学报(自然科学版)

1673-0062

2015

3

6-8

10.19431/j.cnki.1673-0062.2015.03.003

国家自然科学基金资助项目（11375083;11475082）； 湖南省衡阳市科技计划基金资助项目（2013KJ30）；

本校为第一机构

采用多道脉冲幅度分析器测定216 Po 6.78 MeV能谱峰对6.00 MeV计数区的峰重叠因子μ为0.0897.将流气式固体220 Rn源作为标准源测定220 Rn测量仪测220 Rn刻度系数为9.4004.提高了半导体探测法型220 Rn测量仪刻度的准确性与测220 Rn准确度.

In this paper,the calibration of 220 Rn measurement about semiconductor detec-tion-based 220 Rn measurement instrument have been accomplished. And the peak overlap factor and the calibration coefficient were determined by multi-channel pulse amplitude an-alyzer and 220 Rn flow-through source respectively. The results of experiment showed that the probability of 6 . 78 MeVα particle emitted by 216 Po slowing down to the 6 . 00 MeVαparticle counts region can’t be ignored,and it can take 0. 0897,9. 4004 as typical values of peak overlap factor ...