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Effect of roughness of substrate and sputtering power on the properties of TiN coatings deposited by magnetron sputtering for ATF

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成果类型:
期刊论文
作者:
Xiao, Weiwei*;Deng, Hua*;Zou, Shuliang;Ren, Yuhong;Tang, Dewen;...
通讯作者:
Xiao, Weiwei;Deng, Hua
作者机构:
[Xiao, Changfei; Xiao, Weiwei; Zou, Shuliang; Tang, Dewen] Univ South China, Sch Mech Engn, Hengyang 421001, Hunan, Peoples R China.
[Ren, Yuhong; Deng, Hua; Zhou, Xi; Lei, Ming; Xiao, Weiwei; Chen, Yao] CNNC Jianzhong Nucl Fuel Co, Yibin 644000, Sichuan, Peoples R China.
通讯机构:
[Xiao, Weiwei] U
[Deng, Hua] C
Univ South China, Sch Mech Engn, Hengyang 421001, Hunan, Peoples R China.
CNNC Jianzhong Nucl Fuel Co, Yibin 644000, Sichuan, Peoples R China.
语种:
英文
关键词:
Adhesion;Bond strength (materials);Magnetron sputtering;Microstructure;Residual stresses;Scanning electron microscopy;Substrates;Surface roughness;Tin;Titanium nitride;X ray diffraction;Zirconium compounds;Accident tolerant fuels;Adhesion properties;Direct current magnetron sputtering;Roughness of substrates;Sputtering power;Stress magnitude;TiN coating;X ray diffractometers;Coatings
期刊:
Journal of Nuclear Materials
ISSN:
0022-3115
年:
2018
卷:
509
页码:
542-549
基金类别:
This work was supported by CNNC funded project (Research on ATF technology), Scientific research fund of Hunan Provincial Education Department ( 16C1383 ) and University of South China doctorate funding project ( 2015XQD14 ). The authors are grateful to other participants of the project for their cooperation.
机构署名:
本校为第一且通讯机构
院系归属:
机械工程学院
摘要:
TiN coatings have been deposited on Zr-4 substrates using direct current (DC) magnetron sputtering and the effects of roughness of substrate and sputtering power on the microstructure, thickness/deposition rate, adhesion properties and residual stress of coatings have been studied. The microstructures of the coatings were characterized by using scanning electron microscope (SEM) and X-ray diffractometer (XRD). The thicknesses of the coatings were detected by using SEM. The adhesion property was tested by using scratch testing. The residual stre...

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