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Simple leakage Current and 1/f Noise Expressions for Polycrystalline Silicon Thin-Film Transistors

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成果类型:
期刊论文、会议论文
作者:
He, Hongyu*;Deng, Wanling;Liu, Yuan;Lin, Xinnan;Zheng, Xueren;...
通讯作者:
He, Hongyu
作者机构:
[He, Hongyu] Univ South China, Sch Elect Engn, Hengyang 421001, Peoples R China.
[He, Hongyu; Zhang, Shengdong; Lin, Xinnan] Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Shenzhen 518005, Peoples R China.
[Deng, Wanling] Jinan Univ, Dept Elect Engn, Guangzhou 510632, Guangdong, Peoples R China.
[Liu, Yuan] China Elect Produce Reliabil & Environm Testing R, Sci & Technol Reliabil Phys & Applicat Elect Comp, Guangzhou 510610, Guangdong, Peoples R China.
[Zheng, Xueren] South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China.
通讯机构:
[He, Hongyu] U
[He, Hongyu] P
Univ South China, Sch Elect Engn, Hengyang 421001, Peoples R China.
Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Shenzhen 518005, Peoples R China.
语种:
英文
期刊:
2016 IEEE International Conference on Electron Devices and Solid-State Circuits (EDSSC)
年:
2016
页码:
307-309
会议名称:
IEEE International Conference on Electron Devices and Solid-State Circuits (EDSSC)
会议论文集名称:
IEEE International Conference on Electron Devices and Solid-State Circuits
会议时间:
AUG 03-05, 2016
会议地点:
Univ Hong Kong, Hong Kong, PEOPLES R CHINA
会议主办单位:
Univ Hong Kong
会议赞助商:
IEEE, Electron Devices Soc, SSCS, IEEE ED SSC Hong Kong Joint Chapter
出版地:
345 E 47TH ST, NEW YORK, NY 10017 USA
出版者:
IEEE
ISBN:
978-1-5090-1830-7
机构署名:
本校为第一且通讯机构
院系归属:
电气工程学院
摘要:
Simple drain current and 1/f noise expressions are presented for polycrystalline silicon (poly-Si) thin-film transistors (TFTs) in leakage regime. The leakage current expression I-DS is derived from the thermal field emission mechanism. The leakage current noise power spectral density (PSD) expression S-IDS is derived from the carrier number fluctuation theory. It is proved that S-IDS is proportional to I-DS(2), approximately. The current and no...

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