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Nanotribological properties of Ga- and N-faced bulk gallium nitride surfaces determined by nanoscratch experiments

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成果类型:
期刊论文
作者:
Guo, Jian;Qiu, Changjun;Zhu, Huiling;Wang, Yongqiang*
通讯作者:
Wang, Yongqiang
作者机构:
[Guo, Jian; Wang, Yongqiang; Qiu, Changjun; Zhu, Huiling] Univ South China, Sch Mech Engn, Hengyang 421001, Peoples R China.
通讯机构:
[Wang, Yongqiang] U
Univ South China, Sch Mech Engn, Hengyang 421001, Peoples R China.
语种:
英文
关键词:
Friction;High resolution transmission electron microscopy;III-V semiconductors;Nanotribology;Nitrides;Wear of materials;Wear resistance;X ray photoelectron spectroscopy;Zinc sulfide;Conventional techniques;Critical normal loads;Crystallographic symmetry;Frictional coefficients;Gallium nitrides (GaN);Nano-scratch;Nanotribological properties;Native oxide layer;Gallium nitride
期刊:
Materials
ISSN:
1996-1944
年:
2019
卷:
12
期:
17
页码:
2653
基金类别:
This research was funded by the National Natural Science Foundation of China (51805240) and the Natural Science Foundation of Hunan Province (2019JJ50518, 2018JJ2328). We would like to acknowledge Yichia Liao for her proposal concerning nanoscratch experiments and Integrated Service Technology Inc. for the technical support on TEM observation.
机构署名:
本校为第一且通讯机构
院系归属:
机械工程学院
摘要:
Through nanoscratch experiments with a spherical diamond indenter, a contrastive study of the nanotribological properties of Ga- and N-faced gallium nitride (GaN) samples was carried out. Nanoindentation results revealed that the elastic modulus of the Ga-faced GaN sample was slightly higher than that of N-faced GaN sample. Particularly, Ga- and N-faced GaN samples exhibited rather different nanotribological properties, and the Ga-faced sample showed a stronger wear resistance. The study indicated that the critical normal load required to cause...

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