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The effect of coalescence on threading dislocations in GaN films

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成果类型:
期刊论文
作者:
Liu, Yun*;Zhang, Jia
通讯作者:
Liu, Yun
作者机构:
[Liu, Yun] Norwegian Univ Sci & Technol, Dept Phys, N-7491 Trondheim, Norway.
[Zhang, Jia] Univ S China, Sch Mech Engn, Hengyang 421001, Peoples R China.
通讯机构:
[Liu, Yun] N
Norwegian Univ Sci & Technol, Dept Phys, N-7491 Trondheim, Norway.
语种:
英文
关键词:
Atomic force microscopy (AFM);Dislocation;GaN;X-ray diffraction (XRD)
期刊:
Scripta Materialia
ISSN:
1359-6462
年:
2010
卷:
63
期:
1
页码:
109-112
机构署名:
本校为其他机构
院系归属:
机械工程学院
摘要:
The effect of the coalescence of islands on threading dislocations (TDs) in GaN films (300 nm thick) grown on non-annealed and annealed sapphire substrates has been studied. Atomic force microscopy measurements show that the a-type TD density first decreases and then increases during the coalescence process, while the densities of (a + c)- and c-type TDs decrease as coalescence proceeds. X-ray diffraction data indicate that the lattice tilt of GaN films is greatly reduced by coalescence while the change in twist depends on the degree of coalescence. (C) 201...

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